Translation of "Global alignment" in German

This scenario could lead to global alignment.

As the names says, Global Alignment stands for:

The reorganization of the management team is aimed at strengthening the company's global alignment.

Consequently, global alignment was a high priority when the current legislation was developed.

This scenario needs a longer lead time than Scenario 1 and will not achieve global alignment.

In this connection, the syntax of the global alignment description files (GDFs) was also further expanded.

Eberspächer supports the global alignment of our customers in numerous countries directly at the production locations.

The failed G7 summit dealt a very public blow to a once-powerful grouping that had already been challenged by global economic re-alignment, the emergence of the more representative G20, and new forms of regionalism.

Reflecting the global nature of digital technology development, the Commission will continue to proactively engage with key international partners (such as the US, China, Japan, South Korea) to ensure global alignment of priorities in the ICT domain, and a consistent approach to standard setting.

Global alignment was a high priority issue when the current legislation was developed and continues to be so in respect of future emissions standards.

Global consensus and alignment of standard roadmaps will be fostered through cooperation with major trading partners.

A harmonised European market is in many cases a prerequisite for a multilateral dismantling of technical barriers to trade and global alignment of product requirements.

They are based on the best available technology, and applied as feasible to NRMM, taking account of the need for global alignment.

In the long term this scenario cannot achieve global alignment since additional PM limit values will be implemented in the USA.

It is provided according to the present invention that before electron beam exposure begins, an alignment of the wafer (global alignment) is performed on the basis of structural features that were previously generated on the wafer by photolithographic exposure.

Also depicted are global alignment marks 3 that are necessary for the alignment of wafer 1 during photolithographic exposure.

According to the present invention, structures 2, or characteristic structural features of structures 2, or also global alignment marks 3 present for photolithographic exposure, are used for the alignment of wafer 1 in the electron beam exposure system.

In one known method, after a coarse alignment of the wafer, for example by orientation at its geometrical edges, an intermediate step using first marks (hereinafter also called “global alignment marks”) is performed before the actual fine alignment is accomplished based on the alignment marks.

Marks in the form of crosses with an extension of 1 to 2 mm are often used in electron beam lithography as global alignment marks.

The complete global alignment process measures the positions of multiple first marks and calculates the necessary transformations for a relative motion between the wafer and the lithography system, for example of coordinates of a stage on which the wafer is placed in terms of translation, rotation, and scaling, in order to find the alignment marks.

An electron beam exposure system in which a software program operating according to the method is implemented can thus be utilized very flexibly, allowing a wide variety of structural features to be selected as global alignment marks.

Global alignment using the method according to the present invention can be followed by fine alignment of the wafer on the basis of alignment marks present on the wafer.