Übersetzung für "Zum freilegen" in Englisch

Such instruments are used for example for freeing an opening on a hip joint socket.

To expose the optic fibers, firstly the cable jacket is removed.

Only a socialist revolution can clear the road to socialism.

Specially designed for processing of Integrated circuits with cooper wires.

For exposing the sealing tape the L-shaped elements and the U-shaped clamp have to be retracted.

To expose the diamond particles during cutting, a minimum surface pressure is required.

Other options for exposing the contact terminal are also possible.

Finally, the second basis is removed for exposing the conductive structure.

Advantageously, the means for uncovering the discharge opening have a hinged cutting device.

The means for uncovering the discharge opening can comprise a pyrotechnic unit.

This is ideal for exposing the interface of a framework.

A window is then etched in oxide layer 8 to expose region 14.

This phenomenon often results in the backing being exposed and coming in direct contact with the wound.

The BaseBrush Steel MicroFinish by Holmenkol is an ultra-fine brush to completely reveal the structure.

For exposing the holes, the component no longer has to be moved relative to the video system.

The precursor elements are abraded, etched or subjected to a similar process to expose the internal electrodes.

Thereby it is feasible to determine the ideal relative position of the clearing unit versus the base unit for clearing the opening.

The encapsulating compound may then be removed in order to expose the analysis contact in certain areas at the upper surface of the semiconductor component.

Advantageously, the means for uncovering the discharge opening are additional means which are functionally separated from the gas generator.

Advantageously, the means for uncovering the discharge opening are at least partially arranged along an edge of the discharge opening.

A separate method step for exposing the contact regions of the semiconductor chips can be dispensed with in this method variant.

Standard etching techniques of buffered hydrofluoric acid or plasma etching may be used to expose the windows 32' and 33' down to the surface of layer 6.

Resist mask 26 is then used to permit selective removal of the underlying layers 20, 22 and 24 to expose the windows 11', 12', 13' and 14' illustrated in FIG.

BACKGROUND OF THE INVENTION The invention relates to an apparatus for accurately dosing fluids of varying viscosity, especially highly viscous liquids, such as syrups having a high sugar content, comprising a substantially vertically arranged valve channel connectible to a storage container or the like, wherein for closing and opening a valve outlet there is provided a closure portion magnetically liftable against gravity, said valve channel being surrounded by an electromagnetic device for generating the magnetic force.

1d, a window 16 is opened through the photo-resist layer 14 and the silicon dioxide layer 12 to expose the surface of the epitaxial layer 10.

For laying bare the connecting bars, it suffices to rip off the preserving element formed of thermoplastic synthetic material after removal of the shuttering and, with a few hammer blows, to rid the end sections of the connecting bars of the brittle embedding mass.

The epitaxial layer 41 is reduced by an etching treatment, which at the same time serves to expose the scribing lines on the semiconductor wafer, to such an extent that, after the wafer has been subdivided, an epitaxial layer of about 430×430 ?m edge length is present on a semiconductor body of 500×500 ?m edge length.

In a known ventilator roof, German Gebrauchsmuster No. 81 19 662, the roof opening is made in the rear part of the fixed roof surface, and the cover can be taken out to open the roof opening.