Übersetzung für "Plasma enhanced" in Deutsch

Plasma enhanced Chemical Vapour Deposition (CVD) equipment as follows:

Such is the case, for example, with plasma-enhanced processes.

The coating process selected for this example is the PECVD (Plasma Enhanced Chemical Vapor Deposition) method.

The filter layer is produced by sputtering or plasma-enhanced vapor deposition.

This plasma-enhanced catalytic reaction can be schematically divided into two steps:

Plasma-enhanced CVD-depositions, for instance, can be provided with high deposition rates.

But here, the option of plasma enhanced CVD coating (PECVD) lends itself.

Such a layer can be applied, for example, by plasma-enhanced or chemical vapor deposition methods.

Above it is shown schematically the plasma 34 of the plasma-enhanced precipitation process.

A plasma-enhanced chemical vapor deposition method or an atomic layer deposition method may be used, for example.

This plasma enhanced pre-coating phase is maintained until a desired coating thickness is reached.

The barrier layer was deposited by plasma-enhanced vapor deposition.

New developments in the plasma-enhanced chemical vapor deposition (PECVD) process enable high speed top coating.

For coating the DLC layer on this substructure, the researchers are using plasma-enhanced chemical vapour deposition.

This may be achieved e.g., by plasma-enhanced chemical vapor deposition (PECVD) or by cathode evaporation.

Then, the dielectric barrier is opened, for example by plasma-enhanced etching steps by a known semiconductor fabrication techniques.